Atom lithography with subwavelength resolution via Rabi oscillations
Zeyang Liao, M. Al-Amri, Thomas Becker, W. P. Schleich, Marlan O. Scully, and M. Suhail Zubairy
Accepted
We propose two atom lithography techniques with sub-wavelength resolution based on position-dependent Rabi oscillations. Our method either uses neutral or ionized atoms to write sub-wavelength patterns. We illustrate our proposal by numerical simulations of an experimental set-up using Rubidium Rydberg atoms. We show that, for a microwave wavelength of 1.4cm, a spacing of a few hundred nanometers is possible.