Phys. Rev. A 67, 043801 (2003) [4 pages]Enhanced generation of twin single-photon states via quantum interference in parametric down-conversion: Application to two-photon quantum photolithographyReceived 14 November 2002; published 2 April 2003 Two-photon interferometric quantum photon lithography for light of wavelength λ is capable of beating the Rayleigh diffraction limit of resolution λ/4 to the level of λ/8. The required twin single-photon states |1〉a|1〉b, which are converted into maximally entangled states by a 50:50 beam splitter, can be generated from a nondegenerate parametric amplifier initially in vacuum states and with a weak pump field. Increasing the pump strength can slightly increase the production rate of the desired state and it will also increase the production of the twin two-photon states |2〉a|2〉b, which leads to an unwanted background term. In this paper we show that, assuming a weak pair coherent state as input to the amplifier, quantum interference can be used to quench the production of the |2〉a|2〉b state and to enhance the production of the |1〉a|1〉b state by almost sixfold. © 2003 The American Physical Society URL:
http://link.aps.org/doi/10.1103/PhysRevA.67.043801
DOI:
10.1103/PhysRevA.67.043801
PACS:
42.50.Dv, 42.25.Hz, 85.40.Hp
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