Phys. Rev. A 63, 063407 (2001) [8 pages]Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patternsReceived 2 November 2000; published 9 May 2001 As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions. This renders quantum lithography a potentially useful tool in nanotechnology. © 2001 The American Physical Society URL:
http://link.aps.org/doi/10.1103/PhysRevA.63.063407
DOI:
10.1103/PhysRevA.63.063407
PACS:
42.50.Hz, 42.25.Hz, 42.65.-k, 85.40.Hp
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